Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-...

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Veröffentlicht in:Journal of synchrotron radiation. - 1994. - 15(2008), Pt 2 vom: 07. März, Seite 170-5
1. Verfasser: Chen, Y T (VerfasserIn)
Weitere Verfasser: Lo, T N, Chiu, C W, Wang, J Y, Wang, C L, Liu, C J, Wu, S R, Jeng, S T, Yang, C C, Shiue, J, Chen, C H, Hwu, Y, Yin, G C, Lin, H M, Je, J H, Margaritondo, G
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2008
Zugriff auf das übergeordnete Werk:Journal of synchrotron radiation
Schlagworte:Journal Article
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520 |a The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm 
650 4 |a Journal Article 
700 1 |a Lo, T N  |e verfasserin  |4 aut 
700 1 |a Chiu, C W  |e verfasserin  |4 aut 
700 1 |a Wang, J Y  |e verfasserin  |4 aut 
700 1 |a Wang, C L  |e verfasserin  |4 aut 
700 1 |a Liu, C J  |e verfasserin  |4 aut 
700 1 |a Wu, S R  |e verfasserin  |4 aut 
700 1 |a Jeng, S T  |e verfasserin  |4 aut 
700 1 |a Yang, C C  |e verfasserin  |4 aut 
700 1 |a Shiue, J  |e verfasserin  |4 aut 
700 1 |a Chen, C H  |e verfasserin  |4 aut 
700 1 |a Hwu, Y  |e verfasserin  |4 aut 
700 1 |a Yin, G C  |e verfasserin  |4 aut 
700 1 |a Lin, H M  |e verfasserin  |4 aut 
700 1 |a Je, J H  |e verfasserin  |4 aut 
700 1 |a Margaritondo, G  |e verfasserin  |4 aut 
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