Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating

The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-...

Ausführliche Beschreibung

Bibliographische Detailangaben
Veröffentlicht in:	Journal of synchrotron radiation. - 1994. - 15(2008), Pt 2 vom: 07. März, Seite 170-5
1. Verfasser:	Chen, Y T (VerfasserIn)
Weitere Verfasser:	Lo, T N, Chiu, C W, Wang, J Y, Wang, C L, Liu, C J, Wu, S R, Jeng, S T, Yang, C C, Shiue, J, Chen, C H, Hwu, Y, Yin, G C, Lin, H M, Je, J H, Margaritondo, G
Format:	Online-Aufsatz
Sprache:	English
Veröffentlicht:	2008
Zugriff auf das übergeordnete Werk:	Journal of synchrotron radiation
Schlagworte:	Journal Article

Beschreibung
Zusammenfassung:	The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm
Beschreibung:	Date Completed 19.05.2008 Date Revised 25.02.2008 published: Print-Electronic Citation Status PubMed-not-MEDLINE
ISSN:	1600-5775
DOI:	10.1107/S0909049507063510