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231223s2007 xx ||||| 00| ||eng c |
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|a eng
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| 100 |
1 |
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|a Wang, Chih-Feng
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Polybenzoxazine as a mold-release agent for nanoimprint lithography
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| 264 |
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|c 2007
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| 336 |
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|a Text
|b txt
|2 rdacontent
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| 337 |
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|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
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| 338 |
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|a Band
|b nc
|2 rdacarrier
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| 500 |
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|a Date Completed 11.07.2007
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|a Date Revised 15.05.2007
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions
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| 650 |
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|a Journal Article
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1 |
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|a Chiou, Shih-Feng
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Ko, Fu-Hsiang
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Chen, Jem-Kun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Chou, Cheng-Tung
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Huang, Chih-Feng
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kuo, Shiao-Wei
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Chang, Feng-Chih
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 23(2007), 11 vom: 22. Mai, Seite 5868-71
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|x 1520-5827
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| 773 |
1 |
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|g volume:23
|g year:2007
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|g day:22
|g month:05
|g pages:5868-71
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