APA Zitierstil

Wang, C., Chiou, S., Ko, F., Chen, J., Chou, C., Huang, C., . . . Chang, F. (2007). Polybenzoxazine as a mold-release agent for nanoimprint lithography. Langmuir : the ACS journal of surfaces and colloids, 23(11), 5868.

Chicago Zitierstil

Wang, Chih-Feng, Shih-Feng Chiou, Fu-Hsiang Ko, Jem-Kun Chen, Cheng-Tung Chou, Chih-Feng Huang, Shiao-Wei Kuo, und Feng-Chih Chang. "Polybenzoxazine as a Mold-release Agent for Nanoimprint Lithography." Langmuir : The ACS Journal of Surfaces and Colloids 23, no. 11 (2007): 5868.

MLA Zitierstil

Wang, Chih-Feng, et al. "Polybenzoxazine as a Mold-release Agent for Nanoimprint Lithography." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 23, no. 11, 2007, p. 5868.