Polybenzoxazine as a mold-release agent for nanoimprint lithography
One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this...
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 23(2007), 11 vom: 22. Mai, Seite 5868-71 |
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| Auteur principal: | |
| Autres auteurs: | , , , , , , |
| Format: | Article |
| Langue: | English |
| Publié: |
2007
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids |
| Sujets: | Journal Article |