|
|
|
|
| LEADER |
01000naa a22002652 4500 |
| 001 |
NLM154852457 |
| 003 |
DE-627 |
| 005 |
20231223070856.0 |
| 007 |
tu |
| 008 |
231223s2004 xx ||||| 00| ||eng c |
| 028 |
5 |
2 |
|a pubmed24n0516.xml
|
| 035 |
|
|
|a (DE-627)NLM154852457
|
| 035 |
|
|
|a (NLM)15835708
|
| 040 |
|
|
|a DE-627
|b ger
|c DE-627
|e rakwb
|
| 041 |
|
|
|a eng
|
| 100 |
1 |
|
|a Khang, Dahl-Young
|e verfasserin
|4 aut
|
| 245 |
1 |
0 |
|a Sub-100 nm patterning with an amorphous fluoropolymer mold
|
| 264 |
|
1 |
|c 2004
|
| 336 |
|
|
|a Text
|b txt
|2 rdacontent
|
| 337 |
|
|
|a ohne Hilfsmittel zu benutzen
|b n
|2 rdamedia
|
| 338 |
|
|
|a Band
|b nc
|2 rdacarrier
|
| 500 |
|
|
|a Date Completed 12.12.2005
|
| 500 |
|
|
|a Date Revised 26.10.2019
|
| 500 |
|
|
|a published: Print
|
| 500 |
|
|
|a Citation Status PubMed-not-MEDLINE
|
| 520 |
|
|
|a A fluoropolymer mold is introduced and used to pattern sub-100 nm features with the characteristics that cause problems in patterning with a mold. The low surface energy and inertness, stiffness, and permeable nature of the mold material make it possible to pattern without surface treatment densely populated very fine features, mixed patterns of small and large features, and features with a high aspect ratio, when the mold is used with a polymer solution for the patterning. The ultraviolet transparency of the mold material also allows for patterning with photocurable pre-polymers
|
| 650 |
|
4 |
|a Journal Article
|
| 700 |
1 |
|
|a Lee, Hong H
|e verfasserin
|4 aut
|
| 773 |
0 |
8 |
|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1999
|g 20(2004), 6 vom: 16. März, Seite 2445-8
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
|
| 773 |
1 |
8 |
|g volume:20
|g year:2004
|g number:6
|g day:16
|g month:03
|g pages:2445-8
|
| 912 |
|
|
|a GBV_USEFLAG_A
|
| 912 |
|
|
|a SYSFLAG_A
|
| 912 |
|
|
|a GBV_NLM
|
| 912 |
|
|
|a GBV_ILN_22
|
| 912 |
|
|
|a GBV_ILN_350
|
| 912 |
|
|
|a GBV_ILN_721
|
| 951 |
|
|
|a AR
|
| 952 |
|
|
|d 20
|j 2004
|e 6
|b 16
|c 03
|h 2445-8
|