Sub-100 nm patterning with an amorphous fluoropolymer mold
A fluoropolymer mold is introduced and used to pattern sub-100 nm features with the characteristics that cause problems in patterning with a mold. The low surface energy and inertness, stiffness, and permeable nature of the mold material make it possible to pattern without surface treatment densely...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1999. - 20(2004), 6 vom: 16. März, Seite 2445-8 |
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| Format: | Aufsatz |
| Sprache: | English |
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2004
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Zusammenfassung: | A fluoropolymer mold is introduced and used to pattern sub-100 nm features with the characteristics that cause problems in patterning with a mold. The low surface energy and inertness, stiffness, and permeable nature of the mold material make it possible to pattern without surface treatment densely populated very fine features, mixed patterns of small and large features, and features with a high aspect ratio, when the mold is used with a polymer solution for the patterning. The ultraviolet transparency of the mold material also allows for patterning with photocurable pre-polymers |
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| Beschreibung: | Date Completed 12.12.2005 Date Revised 26.10.2019 published: Print Citation Status PubMed-not-MEDLINE |
| ISSN: | 1520-5827 |