A dual functional layer for block copolymer self-assembly and the growth of nanopatterned polymer brushes

par Sweat, Daniel P
Publié dans: Langmuir : the ACS journal of surfaces and colloids (2013)

Cross-linked random copolymer mats as ultrathin nonpreferential layers for block copolymer self-assembly

par Han, Eungnak
Publié dans: Langmuir : the ACS journal of surfaces and colloids (2010)

Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates

par Han, Eungnak
Publié dans: Advanced materials (Deerfield Beach, Fla.) (2010)

One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers

par Hirai, Tomoyasu
Publié dans: Advanced materials (Deerfield Beach, Fla.) (2009)