Spontaneous H2O2 Accumulation under O2 Driven by Sacrificial Oxidation of NiS2 without External Electrical/Photonic Input

Although spontaneous H2O2 accumulation by sacrificial oxidation of metal disulfides (FeS2, NiS2, etc.) under oxic conditions without external electrical/photonic input has been observed, the mechanistic understanding of HCO3- on the production of H2O2 is still not clear. In this study, HCO3- apparen...

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Détails bibliographiques
Publié dans:Langmuir : the ACS journal of surfaces and colloids. - 1985. - 41(2025), 40 vom: 14. Okt., Seite 27492-27501
Auteur principal: Wang, Yu-Le (Auteur)
Autres auteurs: Wang, Cong, Wu, Song-Hai, Liu, Yong, Han, Xu
Format: Article en ligne
Langue:English
Publié: 2025
Accès à la collection:Langmuir : the ACS journal of surfaces and colloids
Sujets:Journal Article