Adaptive Epitaxy of C-Si-Ge-Sn : Customizable Bulk and Quantum Structures

© 2025 The Author(s). Advanced Materials published by Wiley‐VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 37(2025), 37 vom: 10. Sept., Seite e2506919
1. Verfasser: Concepción, Omar (VerfasserIn)
Weitere Verfasser: Devaiya, Ambrishkumar J, Zoellner, Marvin H, Schubert, Markus A, Bärwolf, Florian, Seidel, Lukas, Reboud, Vincent, Tiedemann, Andreas T, Bae, Jin-Hee, Tchelnokov, Alexei, Zhao, Qing-Tai, Broderick, Christopher A, Oehme, Michael, Capellini, Giovanni, Grützmacher, Detlev, Buca, Dan
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2025
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article C(Si)GeSn alloys RP‐CVD epitaxial growth multi quantum wells
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520 |a The successful demonstration of (Si)Ge1-xSnx alloys as direct-gap materials for infrared lasers has driven intense research on group IV-based devices for nanoelectronics, energy harvesting, and quantum computing applications. The material palette of direct-gap group-IV alloys can be further extended by introducing carbon to fine-tune their structural and electronic properties, significantly expanding their functionality. This work presents heteroepitaxial growth of C(Si)GeSn alloys using an industry-standard reduced-pressure chemical vapor deposition reactor. The introduction of CBr4 as a precursor enables controlled incorporation of C atoms (<1 at.%) into the epilayer lattice, while simultaneously increasing the Sn content in the CGeSn alloy up to ≈18 at.%. Carbon plays a key role in modulating strain, stabilizing the crystal structure, and influencing material properties. By leveraging alloying and strain engineering, quaternary CSiGeSn bulk layers and CGeSn/GeSn heterostructures are epitaxially grown. The impact of C incorporation on optical emission is investigated in LEDs based on CGeSn/GeSn multiple quantum wells, demonstrating enhanced near-infrared emission at 2.54 µm, which is sustained up to room temperature 
650 4 |a Journal Article 
650 4 |a C(Si)GeSn alloys 
650 4 |a RP‐CVD 
650 4 |a epitaxial growth 
650 4 |a multi quantum wells 
700 1 |a Devaiya, Ambrishkumar J  |e verfasserin  |4 aut 
700 1 |a Zoellner, Marvin H  |e verfasserin  |4 aut 
700 1 |a Schubert, Markus A  |e verfasserin  |4 aut 
700 1 |a Bärwolf, Florian  |e verfasserin  |4 aut 
700 1 |a Seidel, Lukas  |e verfasserin  |4 aut 
700 1 |a Reboud, Vincent  |e verfasserin  |4 aut 
700 1 |a Tiedemann, Andreas T  |e verfasserin  |4 aut 
700 1 |a Bae, Jin-Hee  |e verfasserin  |4 aut 
700 1 |a Tchelnokov, Alexei  |e verfasserin  |4 aut 
700 1 |a Zhao, Qing-Tai  |e verfasserin  |4 aut 
700 1 |a Broderick, Christopher A  |e verfasserin  |4 aut 
700 1 |a Oehme, Michael  |e verfasserin  |4 aut 
700 1 |a Capellini, Giovanni  |e verfasserin  |4 aut 
700 1 |a Grützmacher, Detlev  |e verfasserin  |4 aut 
700 1 |a Buca, Dan  |e verfasserin  |4 aut 
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856 4 0 |u http://dx.doi.org/10.1002/adma.202506919  |3 Volltext 
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