Photoresist Development for 3D Printing of Conductive Microstructures via Two-Photon Polymerization
© 2024 Wiley‐VCH GmbH.
| Publié dans: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 36(2024), 48 vom: 14. Nov., Seite e2409326 |
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| Auteur principal: | |
| Autres auteurs: | , |
| Format: | Article en ligne |
| Langue: | English |
| Publié: |
2024
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| Accès à la collection: | Advanced materials (Deerfield Beach, Fla.) |
| Sujets: | Journal Article Review 3D printing conductive filler conductive microstructure photoresist two‐photon polymerization |
| Accès en ligne |
Volltext |