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241013s2024 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202408424
|2 doi
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|a pubmed24n1618.xml
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|a (DE-627)NLM378806432
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|a (NLM)39394979
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|a DE-627
|b ger
|c DE-627
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|a eng
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|a Aberl, Johannes
|e verfasserin
|4 aut
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|a All-Epitaxial Self-Assembly of Silicon Color Centers Confined Within Sub-Nanometer Thin Layers Using Ultra-Low Temperature Epitaxy
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|c 2024
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 30.11.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2024 The Author(s). Advanced Materials published by Wiley‐VCH GmbH.
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|a Silicon-based color-centers (SiCCs) have recently emerged as quantum-light sources that can be combined with telecom-range Si Photonics platforms. Unfortunately, using conventional SiCC fabrication schemes, deterministic control over the vertical emitter position is impossible due to the stochastic nature of the required ion-implantation(s). To overcome this bottleneck toward high-yield integration, a radically innovative creation method is demonstrated for various SiCCs with excellent optical quality, solely relying on the epitaxial growth of Si and C-doped Si at atypically-low temperatures in an ultra-clean growth environment. These telecom emitters can be confined within sub-nm thick epilayers embedded within a highly crystalline Si matrix at arbitrary vertical positions. Tuning growth conditions and doping, different well-known SiCC types can be selectively created, including W-centers, T-centers, G-centers, and, especially, a so far unidentified derivative of the latter, introduced as G'-center. The zero-phonon emission from G'-centers at ≈1300 nm can be conveniently tuned by the C-concentration, leading to a systematic wavelength shift and linewidth narrowing toward low emitter densities, which makes both, the epitaxy-based fabrication and the G'-center particularly promising as integrable Si-based single-photon sources and spin-photon interfaces
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|a Journal Article
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|a deterministic position control
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|a epitaxy
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|a quantum light sources
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|a self‐assembly
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|a silicon color centers
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|a Navarrete, Enrique Prado
|e verfasserin
|4 aut
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|a Karaman, Merve
|e verfasserin
|4 aut
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|a Enriquez, Diego Haya
|e verfasserin
|4 aut
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|a Wilflingseder, Christoph
|e verfasserin
|4 aut
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|a Salomon, Andreas
|e verfasserin
|4 aut
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|a Primetzhofer, Daniel
|e verfasserin
|4 aut
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|a Schubert, Markus Andreas
|e verfasserin
|4 aut
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|a Capellini, Giovanni
|e verfasserin
|4 aut
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|a Fromherz, Thomas
|e verfasserin
|4 aut
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|a Deák, Peter
|e verfasserin
|4 aut
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|a Udvarhelyi, Péter
|e verfasserin
|4 aut
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|a Li, Song
|e verfasserin
|4 aut
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|a Gali, Ádám
|e verfasserin
|4 aut
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|a Brehm, Moritz
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 36(2024), 48 vom: 03. Nov., Seite e2408424
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:36
|g year:2024
|g number:48
|g day:03
|g month:11
|g pages:e2408424
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|u http://dx.doi.org/10.1002/adma.202408424
|3 Volltext
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