Inkjet Printing Photoresist with Ultralow Viscosity on Silicon Wafers for Uniform Coating
Inkjet printing is introduced into the photoresist coating process for uniform photoresist film formation on silicon wafers with the in-house inkjet experimental prototype. The optimization of a dual negative voltage waveform is proposed to achieve stable droplet jetting for the ultralow viscosity (...
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Détails bibliographiques
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 40(2024), 21 vom: 28. Mai, Seite 11125-11133
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| Auteur principal: |
Wang, Xiukun
(Auteur) |
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| Autres auteurs: |
Yang, Fan,
Guo, Guanshun,
Li, Jingjun,
Sun, Yadong,
Zhang, Lei |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2024
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids
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| Sujets: | Journal Article |
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