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240503s2024 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202313991
|2 doi
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|a pubmed24n1474.xml
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|a (DE-627)NLM371813174
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|a (NLM)38692575
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a Wang, Dongmei
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Manipulating Radiation-Sensitive Z-DNA Conformation for Enhanced Radiotherapy
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|c 2024
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Completed 18.07.2024
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|a Date Revised 18.07.2024
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a © 2024 Wiley‐VCH GmbH.
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|a DNA double-strand breaks (DSBs) yield highly determines radiotherapy efficacy. However, improving the inherent radiosensitivity of tumor DNA to promote radiation-induced DSBs remains a challenge. Using theoretical and experimental models, the underexplored impact of Z-DNA conformations on radiosensitivity, yielding higher DSBs than other DNA conformations, is discovered. Thereout, a radiosensitization strategy focused on inducing Z-DNA conformation, utilizing CBLHfO2 nanocapsules loaded with a Z-DNA inducer CBL0137, is proposed. A hollow mesoporous HfO2 (HM-HfO2) acts as a delivery and an energy depositor to promote Z-DNA breakage. The nanocapsule permits the smart DSBs accelerator that triggers its radiosensitization with irradiation stimulation. Impressively, the CBL@HfO2 facilitates the B-Z DNA conformational transition, augmenting DSBs about threefold stronger than irradiation alone, generating significant tumor suppression with a 30% cure rate. The approach enables DSBs augmentation by improving the inherent radiosensitivity of DNA. As such, it opens up an era of Z-DNA conformation manipulation in radiotherapy
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|a Journal Article
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|a CBL0137
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4 |
|a DNA double‐strand breaks
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| 650 |
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4 |
|a Z‐DNA conformation
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4 |
|a radiosensitization
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| 650 |
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4 |
|a radiotherapy
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| 650 |
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|a DNA, Z-Form
|2 NLM
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| 650 |
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|a Nanocapsules
|2 NLM
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| 650 |
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7 |
|a Radiation-Sensitizing Agents
|2 NLM
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| 700 |
1 |
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|a Liao, You
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zeng, Hao
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Gu, Chenglu
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wang, Xue
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhu, Shuang
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Guo, Xihong
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Jie
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zheng, Ziye
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Yan, Junfang
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Fuquan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Hou, Lingmi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Gu, Zhanjun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Sun, Baoyun
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 36(2024), 29 vom: 30. Juli, Seite e2313991
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
1 |
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|g volume:36
|g year:2024
|g number:29
|g day:30
|g month:07
|g pages:e2313991
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| 856 |
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|u http://dx.doi.org/10.1002/adma.202313991
|3 Volltext
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