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231227s2024 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.3c02282
|2 doi
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|a eng
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|a Gao, Fan
|e verfasserin
|4 aut
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|a Tension-Induced Localized Wrinkling in a Patched Thin Film Supported by an Elastomer
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|c 2024
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|a Text
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|a ƒaComputermedien
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|a ƒa Online-Ressource
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|a Date Revised 10.01.2024
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a The wrinkling behavior of thin films has received great attention for their applications in developing various wrinkle-based novel technologies. Herein, a new wrinkling system: tension-induced wrinkling in an elastomer-supported patched thin film (TW-P&SF) is investigated by using PDMS-supported patched polyimide thin films with different thicknesses and varied length/width ratios. Different from the well-studied compression-induced wrinkling in an elastomer-supported thin film (CW-SF) and tension-induced wrinkling in an edge-clamped free-standing thin film (TW-FF), in the system of TW-P&SF, the wrinkles are localized near the edge of the film with a finite length that follows a center-symmetric distribution. It was found that the wrinkle length lmax and the wrinkle period λ scale with the film thickness h as λ ∼ h0.86 and lmax ∼ h-0.79. With the assistance of the two-dimensional shear lag model and scaling analysis, the underlying mechanism for wrinkle localization is clarified. Furthermore, the promise of the TW-P&SF-enabled wrinkle-based method as a new method for thin film mechanical characterization is demonstrated
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|a Journal Article
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|a Yao, Yanbo
|e verfasserin
|4 aut
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|a Liu, Tao
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1985
|g 40(2024), 1 vom: 09. Jan., Seite 133-140
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnas
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| 773 |
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|g volume:40
|g year:2024
|g number:1
|g day:09
|g month:01
|g pages:133-140
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|u http://dx.doi.org/10.1021/acs.langmuir.3c02282
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