Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants
Organic photoresist coatings, primarily composed of resins, are commonly used in the electronics industry to protect inorganic underlayers. Conventional photoresist strippers, such as amine-type agents, have shown high removal performance but led to environmental impact and substrate corrosiveness....
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1999. - 39(2023), 41 vom: 17. Okt., Seite 14670-14679
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| 1. Verfasser: |
Hanzawa, Masaki
(VerfasserIn) |
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| Weitere Verfasser: |
Ogura, Taku,
Akamatsu, Masaaki,
Sakai, Kenichi,
Sakai, Hideki |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2023
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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