Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography

Micro/nanospherical lens photolithography (SLPL) constitutes an efficient and precise micro/nanofabrication methodology. It offers advantages over traditional nanolithography approaches, such as cost-effectiveness and ease of implementation. By using micrometer-sized microspheres, SLPL enables the p...

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Publié dans:Langmuir : the ACS journal of surfaces and colloids. - 1985. - 39(2023), 40 vom: 10. Okt., Seite 14328-14335
Auteur principal: Yu, Guoxu (Auteur)
Autres auteurs: Ma, Yuan, Li, Xuan, Yu, Bowen, Zhang, Xinping, Zhang, Xuanhe, Chen, Yiqing, Liang, Zhenwei, Pang, Zuobo, Weng, Ding, Chen, Lei, Wang, Jiadao
Format: Article en ligne
Langue:English
Publié: 2023
Accès à la collection:Langmuir : the ACS journal of surfaces and colloids
Sujets:Journal Article