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231226s2023 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202303120
|2 doi
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|a pubmed24n1191.xml
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|a (DE-627)NLM357599586
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|a (NLM)37257837
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|a DE-627
|b ger
|c DE-627
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|a eng
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|a Liu, Chengwei
|e verfasserin
|4 aut
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|a A Photopatternable Conjugated Polymer with Thermal-Annealing-Promoted Interchain Stacking for Highly Stable Anti-Counterfeiting Materials
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|c 2023
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Revised 07.09.2023
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2023 The Authors. Advanced Materials published by Wiley-VCH GmbH.
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|a Photoresponsive polymers can be conveniently used to fabricate anti-counterfeiting materials through photopatterning. However, an unsolved problem is that ambient light and heat can damage anti-counterfeiting patterns on photoresponsive polymers. Herein, photo- and thermostable anti-counterfeiting materials are developed by photopatterning and thermal annealing of a photoresponsive conjugated polymer (MC-Azo). MC-Azo contains alternating azobenzene and fluorene units in the polymer backbone. To prepare an anti-counterfeiting material, an MC-Azo film is irradiated with polarized blue light through a photomask, and then thermally annealed under the pressure of a photonic stamp. This strategy generates a highly secure anti-counterfeiting material with dual patterns, which is stable to sunlight and heat over 200 °C. A key for the stability is that thermal annealing promotes interchain stacking, which converts photoresponsive MC-Azo to a photostable material. Another key for the stability is that the conjugated structure endows MC-Azo with desirable thermal properties. This study shows that the design of photopatternable conjugated polymers with thermal-annealing-promoted interchain stacking provides a new strategy for the development of highly stable and secure anti-counterfeiting materials
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|a Journal Article
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|a annealing
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|a anti-counterfeiting
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|a conjugated polymers
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|a photoresponsive
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|a stable
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|a Steppert, Ann-Kathrin
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Liu, Yazhi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Weis, Philipp
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Hu, Jianyu
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Nie, Chen
|e verfasserin
|4 aut
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| 700 |
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|a Xu, Wen-Cong
|e verfasserin
|4 aut
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| 700 |
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|a Kuehne, Alexander J C
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Wu, Si
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 35(2023), 36 vom: 01. Sept., Seite e2303120
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
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|g volume:35
|g year:2023
|g number:36
|g day:01
|g month:09
|g pages:e2303120
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|u http://dx.doi.org/10.1002/adma.202303120
|3 Volltext
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|d 35
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|h e2303120
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