How Colloidal Lithography Limits the Optical Quality of Plasmonic Nanohole Arrays

Colloidal lithography utilizes self-assembled particle monolayers as lithographic masks to fabricate arrays of nanostructures by combination of directed evaporation and etching steps. This process provides complex nanostructures over macroscopic areas in a simple, convenient, and parallel fashion wi...

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Publié dans:	Langmuir : the ACS journal of surfaces and colloids. - 1985. - 39(2023), 14 vom: 11. Apr., Seite 5222-5229
Auteur principal:	Goerlitzer, Eric S A (Auteur)
Autres auteurs:	Zhan, Meichen, Choi, Sukyung, Vogel, Nicolas
Format:	Article en ligne
Langue:	English
Publié:	2023
Accès à la collection:	Langmuir : the ACS journal of surfaces and colloids
Sujets:	Journal Article