Goerlitzer, E. S. A., Zhan, M., Choi, S., & Vogel, N. (2023). How Colloidal Lithography Limits the Optical Quality of Plasmonic Nanohole Arrays. Langmuir : the ACS journal of surfaces and colloids, 39(14), 5222. https://doi.org/10.1021/acs.langmuir.3c00328
Style de citation ChicagoGoerlitzer, Eric S A., Meichen Zhan, Sukyung Choi, et Nicolas Vogel. "How Colloidal Lithography Limits the Optical Quality of Plasmonic Nanohole Arrays." Langmuir : The ACS Journal of Surfaces and Colloids 39, no. 14 (2023): 5222. https://dx.doi.org/10.1021/acs.langmuir.3c00328.
Style de citation MLAGoerlitzer, Eric S A., et al. "How Colloidal Lithography Limits the Optical Quality of Plasmonic Nanohole Arrays." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 39, no. 14, 2023, p. 5222.