Unveiling Charge-Transport Mechanisms in Electronic Devices Based on Defect-Engineered MoS2 Covalent Networks

© 2023 The Authors. Advanced Materials published by Wiley-VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 35(2023), 15 vom: 25. Apr., Seite e2211157
1. Verfasser: Ippolito, Stefano (VerfasserIn)
Weitere Verfasser: Urban, Francesca, Zheng, Wenhao, Mazzarisi, Onofrio, Valentini, Cataldo, Kelly, Adam G, Gali, Sai Manoj, Bonn, Mischa, Beljonne, David, Corberi, Federico, Coleman, Jonathan N, Wang, Hai I, Samorì, Paolo
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2023
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article charge-transport properties covalent networks defect engineering electrical devices hopping mechanisms transition metal dichalcogenides
LEADER 01000naa a22002652 4500
001 NLM351590838
003 DE-627
005 20231226051739.0
007 cr uuu---uuuuu
008 231226s2023 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.202211157  |2 doi 
028 5 2 |a pubmed24n1171.xml 
035 |a (DE-627)NLM351590838 
035 |a (NLM)36648210 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Ippolito, Stefano  |e verfasserin  |4 aut 
245 1 0 |a Unveiling Charge-Transport Mechanisms in Electronic Devices Based on Defect-Engineered MoS2 Covalent Networks 
264 1 |c 2023 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 13.04.2023 
500 |a Date Revised 13.04.2023 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a © 2023 The Authors. Advanced Materials published by Wiley-VCH GmbH. 
520 |a Device performance of solution-processed 2D semiconductors in printed electronics has been limited so far by structural defects and high interflake junction resistance. Covalently interconnected networks of transition metal dichalcogenides potentially represent an efficient strategy to overcome both limitations simultaneously. Yet, the charge-transport properties in such systems have not been systematically researched. Here, the charge-transport mechanisms of printed devices based on covalent MoS2 networks are unveiled via multiscale analysis, comparing the effects of aromatic versus aliphatic dithiolated linkers. Temperature-dependent electrical measurements reveal hopping as the dominant transport mechanism: aliphatic systems lead to 3D variable range hopping, unlike the nearest neighbor hopping observed for aromatic linkers. The novel analysis based on percolation theory attributes the superior performance of devices functionalized with π-conjugated molecules to the improved interflake electronic connectivity and formation of additional percolation paths, as further corroborated by density functional calculations. Valuable guidelines for harnessing the charge-transport properties in MoS2 devices based on covalent networks are provided 
650 4 |a Journal Article 
650 4 |a charge-transport properties 
650 4 |a covalent networks 
650 4 |a defect engineering 
650 4 |a electrical devices 
650 4 |a hopping mechanisms 
650 4 |a transition metal dichalcogenides 
700 1 |a Urban, Francesca  |e verfasserin  |4 aut 
700 1 |a Zheng, Wenhao  |e verfasserin  |4 aut 
700 1 |a Mazzarisi, Onofrio  |e verfasserin  |4 aut 
700 1 |a Valentini, Cataldo  |e verfasserin  |4 aut 
700 1 |a Kelly, Adam G  |e verfasserin  |4 aut 
700 1 |a Gali, Sai Manoj  |e verfasserin  |4 aut 
700 1 |a Bonn, Mischa  |e verfasserin  |4 aut 
700 1 |a Beljonne, David  |e verfasserin  |4 aut 
700 1 |a Corberi, Federico  |e verfasserin  |4 aut 
700 1 |a Coleman, Jonathan N  |e verfasserin  |4 aut 
700 1 |a Wang, Hai I  |e verfasserin  |4 aut 
700 1 |a Samorì, Paolo  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 35(2023), 15 vom: 25. Apr., Seite e2211157  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:35  |g year:2023  |g number:15  |g day:25  |g month:04  |g pages:e2211157 
856 4 0 |u http://dx.doi.org/10.1002/adma.202211157  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 35  |j 2023  |e 15  |b 25  |c 04  |h e2211157