Removal Analysis of Residual Photoresist Particles Based on Surface Topography Affected by Exposure Times of Ultraviolet and Developer Solution
Particle removal from the surface of a substrate has been an issue in numerous fields for a long time. In semiconductor processes, for instance, the formation of clean surfaces by removing photoresist (PR) must be followed in order to create neat patterns. Although PR removal has been intensively in...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 38(2022), 51 vom: 27. Dez., Seite 16134-16143
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| 1. Verfasser: |
Park, Jinwon
(VerfasserIn) |
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| Weitere Verfasser: |
Lee, Jaehong,
Han, Seongsoo,
Lee, Hyun-Ro,
Choi, Siyoung Q |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2022
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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