APA Zitierstil

Park, J., Lee, J., Han, S., Lee, H., & Choi, S. Q. (2022). Removal Analysis of Residual Photoresist Particles Based on Surface Topography Affected by Exposure Times of Ultraviolet and Developer Solution. Langmuir : the ACS journal of surfaces and colloids, 38(51), 16134. https://doi.org/10.1021/acs.langmuir.2c02882

Chicago Zitierstil

Park, Jinwon, Jaehong Lee, Seongsoo Han, Hyun-Ro Lee, und Siyoung Q. Choi. "Removal Analysis of Residual Photoresist Particles Based on Surface Topography Affected by Exposure Times of Ultraviolet and Developer Solution." Langmuir : The ACS Journal of Surfaces and Colloids 38, no. 51 (2022): 16134. https://dx.doi.org/10.1021/acs.langmuir.2c02882.

MLA Zitierstil

Park, Jinwon, et al. "Removal Analysis of Residual Photoresist Particles Based on Surface Topography Affected by Exposure Times of Ultraviolet and Developer Solution." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 38, no. 51, 2022, p. 16134.