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231226s2022 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202200639
|2 doi
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|a DE-627
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|e rakwb
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|a eng
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|a Choi, Taeyang
|e verfasserin
|4 aut
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|a Nanoscale Antiferromagnetic Domain Imaging using Full-Field Resonant X-ray Magnetic Diffraction Microscopy
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|c 2022
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|a ƒa Online-Ressource
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|a Date Revised 21.07.2022
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2022 Wiley-VCH GmbH.
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|a The physical properties of magnetic materials frequently depend not only on the microscopic spin and electronic structures, but also on the structures of mesoscopic length scales that emerge, for instance, from domain formations, or chemical and/or electronic phase separations. However, experimental access to such mesoscopic structures is currently limited, especially for antiferromagnets with net zero magnetization. Here, full-field microscopy and resonant magnetic X-ray diffraction are combined to visualize antiferromagnetic (AF) domains of the spin-orbit Mott insulator Sr2 IrO4 with area over ≈0.1 mm2 and with spatial resolution as high as ≈150 nm. With the unprecedented wide field of views and high spatial resolution, an intertwining of two AF domains on a length comparable to the measured average AF domain wall width of 545 nm is revealed. This mesoscopic structure comprises a substantial portion of the sample surface, and thus can result in a macroscopic response unexpected from its microscopic magnetic structure. In particular, the symmetry analysis presented in this work shows that the inversion symmetry, which is preserved by the microscopic AF order, becomes ill-defined at the mesoscopic length scale. This result underscores the importance of this novel technique for a thorough understanding of the physical properties of antiferromagnets
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|a Journal Article
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|a antiferromagnetic domains
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|a full-field microscopy
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|a resonant magnetic X-ray diffraction
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|a Zhang, Zhan
|e verfasserin
|4 aut
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|a Kim, Hoon
|e verfasserin
|4 aut
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|a Park, Sunwook
|e verfasserin
|4 aut
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|a Kim, Jong-Woo
|e verfasserin
|4 aut
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|a Lee, Kyeong Jun
|e verfasserin
|4 aut
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|a Islam, Zahir
|e verfasserin
|4 aut
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|a Welp, Ulrich
|e verfasserin
|4 aut
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|a Chang, Seo Hyoung
|e verfasserin
|4 aut
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|a Kim, B J
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 34(2022), 29 vom: 01. Juli, Seite e2200639
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g volume:34
|g year:2022
|g number:29
|g day:01
|g month:07
|g pages:e2200639
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|u http://dx.doi.org/10.1002/adma.202200639
|3 Volltext
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