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231226s2022 xx |||||o 00| ||eng c |
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|a 10.1002/adma.202200122
|2 doi
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|a pubmed25n1127.xml
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|a (NLM)35288987
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Kumar, Mohit
|e verfasserin
|4 aut
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|a Ultrahigh-Speed In-Memory Electronics Enabled by Proximity-Oxidation-Evolved Metal Oxide Redox Transistors
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|c 2022
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|a Text
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Revised 20.05.2022
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2022 Wiley-VCH GmbH.
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|a The pursuit of a universal device that combines nonvolatile multilevel storage, ultrafast writing/erasing speed, nondestructive readout, and embedded processing with low power consumption demands the development of innovative architectures. Although thin-film transistors and redox-based resistive-switching devices have independently been proven to be ideal building blocks for data processing and storage, it is still difficult to achieve both well-controlled multilevel memory and high-precision ultrafast processing in a single unit, even though this is essential for the large-scale hardware implementation of in-memory computing. In this work, an ultrafast (≈42 ns) and programable redox thin-film transistor (ReTFT) memory made of a proximity-oxidation-grown TiO2 layer is developed, which has on/off ratio of 105 , nonvolatile multilevel analog storage with a long retention time, strong durability, and high reliability. Utilizing the proof-of-concept ReTFTs, circuits capable of performing fundamental NOT, AND, and OR operations with reconfigurable logic-in-memory processing are developed. Further, on-demand signal memory-processing operations, like multi-terminal addressable memory, learning, pattern recognition, and classification, are explored for prospective application in neuromorphic hardware. This device, which operates on a fundamentally different mechanism, presents an alternate solution to the problems associated with the creation of high-performing in-memory processing technology
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|a Journal Article
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|a in-memory processing
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|a multi-terminals
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|a proximity oxidation
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|a ultrafast memory
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|a ultrathin layers
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|a Kim, Unjeong
|e verfasserin
|4 aut
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|a Lee, WangGon
|e verfasserin
|4 aut
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|a Seo, Hyungtak
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 34(2022), 20 vom: 30. Mai, Seite e2200122
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnas
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|g volume:34
|g year:2022
|g number:20
|g day:30
|g month:05
|g pages:e2200122
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|u http://dx.doi.org/10.1002/adma.202200122
|3 Volltext
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