Ultrahigh-Speed In-Memory Electronics Enabled by Proximity-Oxidation-Evolved Metal Oxide Redox Transistors

© 2022 Wiley-VCH GmbH.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 34(2022), 20 vom: 30. Mai, Seite e2200122
1. Verfasser: Kumar, Mohit (VerfasserIn)
Weitere Verfasser: Kim, Unjeong, Lee, WangGon, Seo, Hyungtak
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2022
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article in-memory processing multi-terminals proximity oxidation ultrafast memory ultrathin layers
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520 |a The pursuit of a universal device that combines nonvolatile multilevel storage, ultrafast writing/erasing speed, nondestructive readout, and embedded processing with low power consumption demands the development of innovative architectures. Although thin-film transistors and redox-based resistive-switching devices have independently been proven to be ideal building blocks for data processing and storage, it is still difficult to achieve both well-controlled multilevel memory and high-precision ultrafast processing in a single unit, even though this is essential for the large-scale hardware implementation of in-memory computing. In this work, an ultrafast (≈42 ns) and programable redox thin-film transistor (ReTFT) memory made of a proximity-oxidation-grown TiO2 layer is developed, which has on/off ratio of 105 , nonvolatile multilevel analog storage with a long retention time, strong durability, and high reliability. Utilizing the proof-of-concept ReTFTs, circuits capable of performing fundamental NOT, AND, and OR operations with reconfigurable logic-in-memory processing are developed. Further, on-demand signal memory-processing operations, like multi-terminal addressable memory, learning, pattern recognition, and classification, are explored for prospective application in neuromorphic hardware. This device, which operates on a fundamentally different mechanism, presents an alternate solution to the problems associated with the creation of high-performing in-memory processing technology 
650 4 |a Journal Article 
650 4 |a in-memory processing 
650 4 |a multi-terminals 
650 4 |a proximity oxidation 
650 4 |a ultrafast memory 
650 4 |a ultrathin layers 
700 1 |a Kim, Unjeong  |e verfasserin  |4 aut 
700 1 |a Lee, WangGon  |e verfasserin  |4 aut 
700 1 |a Seo, Hyungtak  |e verfasserin  |4 aut 
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773 1 8 |g volume:34  |g year:2022  |g number:20  |g day:30  |g month:05  |g pages:e2200122 
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