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231225s2022 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.1c02442
|2 doi
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|a eng
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|a Setiawan, Raymond Christopher
|e verfasserin
|4 aut
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| 245 |
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|a Dependence of Interfacial Adhesion between Substances on Their Electron Work Functions
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|c 2022
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Revised 08.02.2022
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a In this article, we demonstrate the dependence of the adhesive force (FAd) between two different substances on their electron work functions (EWF or φ) without atomic diffusion involved. The adhesive forces between Si3N4 and a number of metals were measured using an atomic force microscope. It is shown that the larger the difference in φ between the two substances in contact, the larger the FAd. FAd is also influenced by the electron freedom and density (related to the charge availability). An analytical model is proposed to elucidate the underlying mechanism and quantify the adhesive interaction
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|a Journal Article
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|a Wu, Mingyu
|e verfasserin
|4 aut
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| 700 |
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|a Li, D Y
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 38(2022), 5 vom: 08. Feb., Seite 1672-1679
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|g volume:38
|g year:2022
|g number:5
|g day:08
|g month:02
|g pages:1672-1679
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|u http://dx.doi.org/10.1021/acs.langmuir.1c02442
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