Dependence of Interfacial Adhesion between Substances on Their Electron Work Functions

In this article, we demonstrate the dependence of the adhesive force (FAd) between two different substances on their electron work functions (EWF or φ) without atomic diffusion involved. The adhesive forces between Si3N4 and a number of metals were measured using an atomic force microscope. It is sh...

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Détails bibliographiques
Publié dans:Langmuir : the ACS journal of surfaces and colloids. - 1985. - 38(2022), 5 vom: 08. Feb., Seite 1672-1679
Auteur principal: Setiawan, Raymond Christopher (Auteur)
Autres auteurs: Wu, Mingyu, Li, D Y
Format: Article en ligne
Langue:English
Publié: 2022
Accès à la collection:Langmuir : the ACS journal of surfaces and colloids
Sujets:Journal Article
Description
Résumé:In this article, we demonstrate the dependence of the adhesive force (FAd) between two different substances on their electron work functions (EWF or φ) without atomic diffusion involved. The adhesive forces between Si3N4 and a number of metals were measured using an atomic force microscope. It is shown that the larger the difference in φ between the two substances in contact, the larger the FAd. FAd is also influenced by the electron freedom and density (related to the charge availability). An analytical model is proposed to elucidate the underlying mechanism and quantify the adhesive interaction
Description:Date Revised 08.02.2022
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1520-5827
DOI:10.1021/acs.langmuir.1c02442