A practical method for determining film thickness using X-ray absorption spectroscopy in total electron yield mode
Thin films formed on surfaces have a large impact on the properties of materials and devices. In this study, a method is proposed using X-ray absorption spectroscopy to derive the film thickness of a thin film formed on a substrate using the spectral separation and logarithmic equation, which is a m...
| Veröffentlicht in: | Journal of synchrotron radiation. - 1994. - 28(2021), Pt 6 vom: 01. Nov., Seite 1820-1824 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2021
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| Zugriff auf das übergeordnete Werk: | Journal of synchrotron radiation |
| Schlagworte: | Journal Article X-ray absorption fine structure (XAFS) copper oxide film thickness silicon dioxide |
| Online verfügbar |
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