Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition
To enable area-selective atomic layer deposition (AS-ALD), self-assembled monolayers (SAMs) have been used as the surface inhibitor to block a variety of ALD processes. The integrity of the SAM throughout the ALD process is critical to AS-ALD. Despite the demonstrated effectiveness of inhibition by...
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Détails bibliographiques
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 37(2021), 39 vom: 05. Okt., Seite 11637-11645
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| Auteur principal: |
Liu, Tzu-Ling
(Auteur) |
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| Autres auteurs: |
Zeng, Li,
Nardi, Katie L,
Hausmann, Dennis M,
Bent, Stacey F |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2021
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids
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| Sujets: | Journal Article |
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