Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition
To enable area-selective atomic layer deposition (AS-ALD), self-assembled monolayers (SAMs) have been used as the surface inhibitor to block a variety of ALD processes. The integrity of the SAM throughout the ALD process is critical to AS-ALD. Despite the demonstrated effectiveness of inhibition by...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 37(2021), 39 vom: 05. Okt., Seite 11637-11645
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| 1. Verfasser: |
Liu, Tzu-Ling
(VerfasserIn) |
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| Weitere Verfasser: |
Zeng, Li,
Nardi, Katie L,
Hausmann, Dennis M,
Bent, Stacey F |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2021
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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