This paper presents the required structure and function of a ring-FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100 m-long straight section that conducts an extremely low emittance beam from a fourth-generation storage ring can increase the average power at 13.5 n...
Détails bibliographiques
| Publié dans: | Journal of synchrotron radiation. - 1994. - 27(2020), Pt 4 vom: 01. Juli, Seite 864-869
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| Auteur principal: |
Lee, Jaeyu
(Auteur) |
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| Autres auteurs: |
Jang, G,
Kim, J,
Oh, B,
Kim, D E,
Lee, S,
Kim, J H,
Ko, J,
Min, C,
Shin, S |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2020
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| Accès à la collection: | Journal of synchrotron radiation
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| Sujets: | Journal Article
EUV
fourth-generation storage ring
free-electron laser |
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