APA Zitierstil

Lee, J., Jang, G., Kim, J., Oh, B., Kim, D. E., Lee, S., . . . Shin, S. (2020). Demonstration of a ring-FEL as an EUV lithography tool. Journal of synchrotron radiation, 27(Pt 4), 864. https://doi.org/10.1107/S1600577520005676

Chicago Zitierstil

Lee, Jaeyu, et al. "Demonstration of a Ring-FEL as an EUV Lithography Tool." Journal of Synchrotron Radiation 27, no. Pt 4 (2020): 864. https://dx.doi.org/10.1107/S1600577520005676.

MLA Zitierstil

Lee, Jaeyu, et al. "Demonstration of a Ring-FEL as an EUV Lithography Tool." Journal of Synchrotron Radiation, vol. 27, no. Pt 4, 2020, p. 864.