A Different Silica Surface : Radical Oxidation of Poly(methylsilsesquioxane) Thin Films and Particles (Tospearl)
Surfaces that exhibit the reactivity of silica toward surface modification (silanol condensation) were prepared by treating thin films and particles of poly(methylsilsesquioxane) with aqueous potassium persulfate at elevated temperature. Parallel experiments were carried out using a highly cross-lin...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 36(2020), 34 vom: 01. Sept., Seite 10110-10119
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| 1. Verfasser: |
Saito, Yu
(VerfasserIn) |
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| Weitere Verfasser: |
Wang, Liming,
Zheng, Peiwen,
Bian, Pei,
McCarthy, Thomas J |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2020
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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