Saito, Y., Wang, L., Zheng, P., Bian, P., & McCarthy, T. J. (2020). A Different Silica Surface: Radical Oxidation of Poly(methylsilsesquioxane) Thin Films and Particles (Tospearl). Langmuir : the ACS journal of surfaces and colloids, 36(34), 10110. https://doi.org/10.1021/acs.langmuir.0c01477
Style de citation ChicagoSaito, Yu, Liming Wang, Peiwen Zheng, Pei Bian, et Thomas J. McCarthy. "A Different Silica Surface: Radical Oxidation of Poly(methylsilsesquioxane) Thin Films and Particles (Tospearl)." Langmuir : The ACS Journal of Surfaces and Colloids 36, no. 34 (2020): 10110. https://dx.doi.org/10.1021/acs.langmuir.0c01477.
Style de citation MLASaito, Yu, et al. "A Different Silica Surface: Radical Oxidation of Poly(methylsilsesquioxane) Thin Films and Particles (Tospearl)." Langmuir : The ACS Journal of Surfaces and Colloids, vol. 36, no. 34, 2020, p. 10110.