Fundamentals of Using Cracked Film Lithography to Pattern Transparent Conductive Metal Grids for Photovoltaics

The fundamentals of using cracked film lithography (CFL) to fabricate metal grids for transparent contacts in solar cells were studied. The underlying physics of drying-induced cracks were well-predicted by an empirical correlation relating crack spacing to capillary pressure. CFL is primarily contr...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1999. - 36(2020), 17 vom: 05. Mai, Seite 4630-4636
1. Verfasser: Muzzillo, Christopher P (VerfasserIn)
Weitere Verfasser: Reese, Matthew O, Mansfield, Lorelle M
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2020
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article