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231225s2020 xx |||||o 00| ||eng c |
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|a 10.1021/acs.langmuir.0c00276
|2 doi
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Muzzillo, Christopher P
|e verfasserin
|4 aut
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|a Fundamentals of Using Cracked Film Lithography to Pattern Transparent Conductive Metal Grids for Photovoltaics
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|c 2020
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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|2 rdacarrier
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|a Date Revised 05.05.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a The fundamentals of using cracked film lithography (CFL) to fabricate metal grids for transparent contacts in solar cells were studied. The underlying physics of drying-induced cracks were well-predicted by an empirical correlation relating crack spacing to capillary pressure. CFL is primarily controlled by varying the crack template thickness, which establishes a three-way tradeoff between the areal density of cracks, crack width, and spacing between cracks, which in turn determine final grid transmittance, grid sheet resistance, and the semiconductor resistance for a given solar cell. Since CFL uses a lift-off process, an additional constraint is that the metal thickness must be less than 1/3 of the crack template thickness. The transmittance/grid sheet resistance/wire spacing tradeoffs measured in this work were used to calculate solar cell performance: CFL-patterned grids should outperform screen-printed grids for narrow cells (0.5-2 cm wide) and/or cells with high semiconductor sheet resistance (≥100 Ω/sq), making CFL attractive for monolithically integrated thin-film photovoltaic modules
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|a Journal Article
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|a Reese, Matthew O
|e verfasserin
|4 aut
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|a Mansfield, Lorelle M
|e verfasserin
|4 aut
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1999
|g 36(2020), 17 vom: 05. Mai, Seite 4630-4636
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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|g volume:36
|g year:2020
|g number:17
|g day:05
|g month:05
|g pages:4630-4636
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|u http://dx.doi.org/10.1021/acs.langmuir.0c00276
|3 Volltext
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