Josephson Effect and Charge Distribution in Thin Bi2 Te3 Topological Insulators

© 2020 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 32(2020), 14 vom: 01. Apr., Seite e1908351
1. Verfasser: Stehno, Martin P (VerfasserIn)
Weitere Verfasser: Ngabonziza, Prosper, Myoren, Hiroaki, Brinkman, Alexander
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2020
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Josephson junctions bismuth telluride diffusive transport superconductivity topological insulators
Beschreibung
Zusammenfassung:© 2020 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Thin layers of topological insulator materials are quasi-2D systems featuring a complex interplay between quantum confinement and topological band structure. To understand the role of the spatial distribution of carriers in electrical transport, the Josephson effect, magnetotransport, and weak anti-localization are studied in bottom-gated thin Bi2 Te3 topological insulator films. The experimental carrier densities are compared to a model based on the solutions of the self-consistent Schrödinger-Poisson equations and they are in excellent agreement. The modeling allows for a quantitative interpretation of the weak antilocalization correction to the conduction and of the critical current of Josephson junctions with weak links made from such films without any ad hoc assumptions
Beschreibung:Date Revised 30.09.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201908351