Narrowing Desiccating Crack Patterns by an Azeotropic Solvent for the Fabrication of Nanomesh Electrodes

Desiccation of a colloidal layer produces crack patterns because of stress arising out of solvent evaporation. Associated with it is the rearrangement of particles, while adhesion to the substrate resists such movements. The nature of solvent, which is often overlooked, plays a key role in the proce...

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Détails bibliographiques

Publié dans:	Langmuir : the ACS journal of surfaces and colloids. - 1985. - 35(2019), 49 vom: 10. Dez., Seite 16130-16135
Auteur principal:	Pujar, Rajashekhar (Auteur)
Autres auteurs:	Kumar, Ankush, Rao, K D M, Sadhukhan, Supti, Dutta, Tapati, Tarafdar, Sujata, Kulkarni, Giridhar U
Format:	Article en ligne
Langue:	English
Publié:	2019
Accès à la collection:	Langmuir : the ACS journal of surfaces and colloids
Sujets:	Journal Article