Narrowing Desiccating Crack Patterns by an Azeotropic Solvent for the Fabrication of Nanomesh Electrodes
Desiccation of a colloidal layer produces crack patterns because of stress arising out of solvent evaporation. Associated with it is the rearrangement of particles, while adhesion to the substrate resists such movements. The nature of solvent, which is often overlooked, plays a key role in the proce...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 35(2019), 49 vom: 10. Dez., Seite 16130-16135
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| 1. Verfasser: |
Pujar, Rajashekhar
(VerfasserIn) |
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| Weitere Verfasser: |
Kumar, Ankush,
Rao, K D M,
Sadhukhan, Supti,
Dutta, Tapati,
Tarafdar, Sujata,
Kulkarni, Giridhar U |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2019
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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