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231225s2019 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201901400
|2 doi
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|a pubmed24n0989.xml
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|a (DE-627)NLM296826979
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|a (NLM)31063271
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|a DE-627
|b ger
|c DE-627
|e rakwb
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| 041 |
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|a eng
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| 100 |
1 |
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|a Park, Han Wool
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Universal Route to Impart Orthogonality to Polymer Semiconductors for Sub-Micrometer Tandem Electronics
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|c 2019
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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| 338 |
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a © 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a A universal method that enables utilization of conventional photolithography for processing a variety of polymer semiconductors is developed. The method relies on imparting chemical and physical orthogonality to a polymer film via formation of a semi-interpenetrating diphasic polymer network with a bridged polysilsesquioxane structure, which is termed an orthogonal polymer semiconductor gel. The synthesized gel films remain tolerant to various chemical and physical etching processes involved in photolithography, thereby facilitating fabrication of high-resolution patterns of polymer semiconductors. This method is utilized for fabricating tandem electronics, including pn-complementary inverter logic devices and pixelated polymer light-emitting diodes, which require deposition of multiple polymer semiconductors through solution processes. This novel and universal method is expected to significantly influence the development of advanced polymer electronics requiring sub-micrometer tandem structures
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|a Journal Article
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|a orthogonal polymer semiconductor gel
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|a photolithography
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|a semi-interpenetrating diphasic polymer network
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|a sequential solution processes
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|a sub-micrometer tandem electronics
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| 700 |
1 |
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|a Choi, Keun-Yeong
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Shin, Jihye
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kang, Boseok
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Hwang, Haejung
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Choi, Shinyoung
|e verfasserin
|4 aut
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1 |
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|a Song, Aeran
|e verfasserin
|4 aut
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1 |
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|a Kim, Jaehee
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kweon, Hyukmin
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, Seunghan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Chung, Kwun-Bum
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, BongSoo
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Cho, Kilwon
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kwon, Soon-Ki
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, Yun-Hi
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kang, Moon Sung
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lee, Hojin
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Kim, Do Hwan
|e verfasserin
|4 aut
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| 773 |
0 |
8 |
|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 31(2019), 28 vom: 30. Juli, Seite e1901400
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
1 |
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|g volume:31
|g year:2019
|g number:28
|g day:30
|g month:07
|g pages:e1901400
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| 856 |
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|u http://dx.doi.org/10.1002/adma.201901400
|3 Volltext
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