Enhanced Charge Injection Properties of Organic Field-Effect Transistor by Molecular Implantation Doping

© 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 31(2019), 10 vom: 30. März, Seite e1806697
1. Verfasser: Kim, Youngrok (VerfasserIn)
Weitere Verfasser: Chung, Seungjun, Cho, Kyungjune, Harkin, David, Hwang, Wang-Taek, Yoo, Daekyoung, Kim, Jae-Keun, Lee, Woocheol, Song, Younggul, Ahn, Heebeom, Hong, Yongtaek, Sirringhaus, Henning, Kang, Keehoon, Lee, Takhee
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2019
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article F4-TCNQ PBTTT charge injection doping organic field-effect transistors solid-state diffusion
LEADER 01000naa a22002652 4500
001 NLM292951892
003 DE-627
005 20231225074243.0
007 cr uuu---uuuuu
008 231225s2019 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.201806697  |2 doi 
028 5 2 |a pubmed24n0976.xml 
035 |a (DE-627)NLM292951892 
035 |a (NLM)30667548 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Kim, Youngrok  |e verfasserin  |4 aut 
245 1 0 |a Enhanced Charge Injection Properties of Organic Field-Effect Transistor by Molecular Implantation Doping 
264 1 |c 2019 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 06.03.2019 
500 |a Date Revised 22.02.2021 
500 |a published: Print-Electronic 
500 |a ErratumIn: Adv Mater. 2020 Sep;32(38):e2003126. - PMID 33617046 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a © 2019 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a Organic semiconductors (OSCs) have been widely studied due to their merits such as mechanical flexibility, solution processability, and large-area fabrication. However, OSC devices still have to overcome contact resistance issues for better performances. Because of the Schottky contact at the metal-OSC interfaces, a non-ideal transfer curve feature often appears in the low-drain voltage region. To improve the contact properties of OSCs, there have been several methods reported, including interface treatment by self-assembled monolayers and introducing charge injection layers. Here, a selective contact doping of 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F4 -TCNQ) by solid-state diffusion in poly(2,5-bis(3-hexadecylthiophen-2-yl)thieno[3,2-b]thiophene) (PBTTT) to enhance carrier injection in bottom-gate PBTTT organic field-effect transistors (OFETs) is demonstrated. Furthermore, the effect of post-doping treatment on diffusion of F4 -TCNQ molecules in order to improve the device stability is investigated. In addition, the application of the doping technique to the low-voltage operation of PBTTT OFETs with high-k gate dielectrics demonstrated a potential for designing scalable and low-power organic devices by utilizing doping of conjugated polymers 
650 4 |a Journal Article 
650 4 |a F4-TCNQ 
650 4 |a PBTTT 
650 4 |a charge injection 
650 4 |a doping 
650 4 |a organic field-effect transistors 
650 4 |a solid-state diffusion 
700 1 |a Chung, Seungjun  |e verfasserin  |4 aut 
700 1 |a Cho, Kyungjune  |e verfasserin  |4 aut 
700 1 |a Harkin, David  |e verfasserin  |4 aut 
700 1 |a Hwang, Wang-Taek  |e verfasserin  |4 aut 
700 1 |a Yoo, Daekyoung  |e verfasserin  |4 aut 
700 1 |a Kim, Jae-Keun  |e verfasserin  |4 aut 
700 1 |a Lee, Woocheol  |e verfasserin  |4 aut 
700 1 |a Song, Younggul  |e verfasserin  |4 aut 
700 1 |a Ahn, Heebeom  |e verfasserin  |4 aut 
700 1 |a Hong, Yongtaek  |e verfasserin  |4 aut 
700 1 |a Sirringhaus, Henning  |e verfasserin  |4 aut 
700 1 |a Kang, Keehoon  |e verfasserin  |4 aut 
700 1 |a Lee, Takhee  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 31(2019), 10 vom: 30. März, Seite e1806697  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:31  |g year:2019  |g number:10  |g day:30  |g month:03  |g pages:e1806697 
856 4 0 |u http://dx.doi.org/10.1002/adma.201806697  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 31  |j 2019  |e 10  |b 30  |c 03  |h e1806697