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231225s2018 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201803665
|2 doi
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|a pubmed25n0958.xml
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|a (DE-627)NLM287722953
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|a (NLM)30133881
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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|a Zhang, Yu
|e verfasserin
|4 aut
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|a Edge-Epitaxial Growth of 2D NbS2 -WS2 Lateral Metal-Semiconductor Heterostructures
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|c 2018
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Revised 27.02.2024
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|a published: Print-Electronic
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|a Citation Status Publisher
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|a © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a 2D metal-semiconductor heterostructures based on transition metal dichalcogenides (TMDs) are considered as intriguing building blocks for various fields, such as contact engineering and high-frequency devices. Although, a series of p-n junctions utilizing semiconducting TMDs have been constructed hitherto, the realization of such a scheme using 2D metallic analogs has not been reported. Here, the synthesis of uniform monolayer metallic NbS2 on sapphire substrate with domain size reaching to a millimeter scale via a facile chemical vapor deposition (CVD) route is demonstrated. More importantly, the epitaxial growth of NbS2 -WS2 lateral metal-semiconductor heterostructures via a "two-step" CVD method is realized. Both the lateral and vertical NbS2 -WS2 heterostructures are achieved here. Transmission electron microscopy studies reveal a clear chemical modulation with distinct interfaces. Raman and photoluminescence maps confirm the precisely controlled spatial modulation of the as-grown NbS2 -WS2 heterostructures. The existence of the NbS2 -WS2 heterostructures is further manifested by electrical transport measurements. This work broadens the horizon of the in situ synthesis of TMD-based heterostructures and enlightens the possibility of applications based on 2D metal-semiconductor heterostructures
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|a Journal Article
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|a NbS2-WS2 heterostructures
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|a controllable growth
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|a metal-semiconductor heterostructures
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|a metallic transition metal dichalcogenides (TMDs)
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|a Yin, Lei
|e verfasserin
|4 aut
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|a Chu, Junwei
|e verfasserin
|4 aut
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|a Shifa, Tofik Ahmed
|e verfasserin
|4 aut
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|a Xia, Jing
|e verfasserin
|4 aut
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|a Wang, Feng
|e verfasserin
|4 aut
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|a Wen, Yao
|e verfasserin
|4 aut
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|a Zhan, Xueying
|e verfasserin
|4 aut
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|a Wang, Zhenxing
|e verfasserin
|4 aut
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|a He, Jun
|e verfasserin
|4 aut
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g (2018) vom: 22. Aug., Seite e1803665
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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|g year:2018
|g day:22
|g month:08
|g pages:e1803665
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|u http://dx.doi.org/10.1002/adma.201803665
|3 Volltext
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