In situ and real-time monitoring of structure formation during non-reactive sputter deposition of lanthanum and reactive sputter deposition of lanthanum nitride
Lanthanum and lanthanum nitride thin films were deposited by magnetron sputtering onto silicon wafers covered by natural oxide. In situ and real-time synchrotron radiation experiments during deposition reveal that lanthanum crystallizes in the face-centred cubic bulk phase. Lanthanum nitride, howeve...
Description complète
Détails bibliographiques
| Publié dans: | Journal of applied crystallography. - 1998. - 51(2018), Pt 4 vom: 01. Aug., Seite 1013-1020
|
|---|
| Auteur principal: |
Krause, Bärbel
(Auteur) |
|---|
| Autres auteurs: |
Kuznetsov, Dmitry S,
Yakshin, Andrey E,
Ibrahimkutty, Shyjumon,
Baumbach, Tilo,
Bijkerk, Fred |
|---|
| Format: | Article en ligne
|
|---|
| Langue: | English |
|---|
| Publié: |
2018
|
|---|
| Accès à la collection: | Journal of applied crystallography
|
|---|
| Sujets: | Journal Article
X-ray optics
extreme UV
nitrides
sputter deposition |
|---|