In situ and real-time monitoring of structure formation during non-reactive sputter deposition of lanthanum and reactive sputter deposition of lanthanum nitride

Lanthanum and lanthanum nitride thin films were deposited by magnetron sputtering onto silicon wafers covered by natural oxide. In situ and real-time synchrotron radiation experiments during deposition reveal that lanthanum crystallizes in the face-centred cubic bulk phase. Lanthanum nitride, howeve...

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Veröffentlicht in:Journal of applied crystallography. - 1998. - 51(2018), Pt 4 vom: 01. Aug., Seite 1013-1020
1. Verfasser: Krause, Bärbel (VerfasserIn)
Weitere Verfasser: Kuznetsov, Dmitry S, Yakshin, Andrey E, Ibrahimkutty, Shyjumon, Baumbach, Tilo, Bijkerk, Fred
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2018
Zugriff auf das übergeordnete Werk:Journal of applied crystallography
Schlagworte:Journal Article X-ray optics extreme UV nitrides sputter deposition