Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement
In UV nanoimprinting, the selection of monomers suitable for sub-15 nm patterning is difficult because the filling behavior of resin at this scale still remains scientifically unclear. We demonstrate sub-15 nm patterning by UV nanoimprinting using silica molds with 20, 15, and 7 nm diameter holes; h...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 34(2018), 32 vom: 14. Aug., Seite 9366-9375
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| 1. Verfasser: |
Ito, Shunya
(VerfasserIn) |
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| Weitere Verfasser: |
Kasuya, Motohiro,
Kawasaki, Kenji,
Washiya, Ryuta,
Shimazaki, Yuzuru,
Miyauchi, Akihiro,
Kurihara, Kazue,
Nakagawa, Masaru |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2018
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't |
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