Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement
In UV nanoimprinting, the selection of monomers suitable for sub-15 nm patterning is difficult because the filling behavior of resin at this scale still remains scientifically unclear. We demonstrate sub-15 nm patterning by UV nanoimprinting using silica molds with 20, 15, and 7 nm diameter holes; h...
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Détails bibliographiques
| Publié dans: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 34(2018), 32 vom: 14. Aug., Seite 9366-9375
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| Auteur principal: |
Ito, Shunya
(Auteur) |
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| Autres auteurs: |
Kasuya, Motohiro,
Kawasaki, Kenji,
Washiya, Ryuta,
Shimazaki, Yuzuru,
Miyauchi, Akihiro,
Kurihara, Kazue,
Nakagawa, Masaru |
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| Format: | Article en ligne
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| Langue: | English |
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| Publié: |
2018
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| Accès à la collection: | Langmuir : the ACS journal of surfaces and colloids
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| Sujets: | Journal Article
Research Support, Non-U.S. Gov't |
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