Thickness-dependent structural characteristics for a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers
The interior structure, morphology and ligand surrounding of a sputtering-deposited chromium monolayer and Cr/C and Cr/Sc multilayers are determined by various hard X-ray techniques in order to reveal the growth characteristics of Cr-based thin films. A Cr monolayer presents a three-stage growth mod...
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Bibliographische Detailangaben
| Veröffentlicht in: | Journal of synchrotron radiation. - 1994. - 25(2018), Pt 3 vom: 01. Mai, Seite 785-792
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| 1. Verfasser: |
Jiang, Hui
(VerfasserIn) |
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| Weitere Verfasser: |
Wang, Hua,
Zhu, Jingtao,
Xue, Chaofan,
Zhang, Jiayi,
Tian, Naxi,
Li, Aiguo |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2018
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| Zugriff auf das übergeordnete Werk: | Journal of synchrotron radiation
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| Schlagworte: | Journal Article
X-ray multilayer
chromium
growth
interface
ligand |
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