Focusing X-ray free-electron laser pulses using Kirkpatrick-Baez mirrors at the NCI hutch of the PAL-XFEL

The Pohang Accelerator Laboratory X-ray Free-Electron Laser (PAL-XFEL) is a recently commissioned X-ray free-electron laser (XFEL) facility that provides intense ultrashort X-ray pulses based on the self-amplified spontaneous emission process. The nano-crystallography and coherent imaging (NCI) hutc...

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Détails bibliographiques
Publié dans:Journal of synchrotron radiation. - 1994. - 25(2018), Pt 1 vom: 01. Jan., Seite 289-292
Auteur principal: Kim, Jangwoo (Auteur)
Autres auteurs: Kim, Hyo Yun, Park, Jaehyun, Kim, Sangsoo, Kim, Sunam, Rah, Seungyu, Lim, Jun, Nam, Ki Hyun
Format: Article en ligne
Langue:English
Publié: 2018
Accès à la collection:Journal of synchrotron radiation
Sujets:Journal Article KB mirror NCI PAL-XFEL X-ray free-electron laser X-ray optics microfocusing
Description
Résumé:The Pohang Accelerator Laboratory X-ray Free-Electron Laser (PAL-XFEL) is a recently commissioned X-ray free-electron laser (XFEL) facility that provides intense ultrashort X-ray pulses based on the self-amplified spontaneous emission process. The nano-crystallography and coherent imaging (NCI) hutch with forward-scattering geometry is located at the hard X-ray beamline of the PAL-XFEL and provides opportunities to perform serial femtosecond crystallography and coherent X-ray diffraction imaging. To produce intense high-density XFEL pulses at the interaction positions between the X-rays and various samples, a microfocusing Kirkpatrick-Baez (KB) mirror system that includes an ultra-precision manipulator has been developed. In this paper, the design of a KB mirror system that focuses the hard XFEL beam onto a fixed sample point of the NCI hutch, which is positioned along the hard XFEL beamline, is described. The focusing system produces a two-dimensional focusing beam at approximately 2 µm scale across the 2-11 keV photon energy range. XFEL pulses of 9.7 keV energy were successfully focused onto an area of size 1.94 µm × 2.08 µm FWHM
Description:Date Revised 20.11.2019
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1600-5775
DOI:10.1107/S1600577517016186