Direct Observations of Nanofilament Evolution in Switching Processes in HfO2 -Based Resistive Random Access Memory by In Situ TEM Studies

© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 29(2017), 10 vom: 15. März
1. Verfasser: Li, Chao (VerfasserIn)
Weitere Verfasser: Gao, Bin, Yao, Yuan, Guan, Xiangxiang, Shen, Xi, Wang, Yanguo, Huang, Peng, Liu, Lifeng, Liu, Xiaoyan, Li, Junjie, Gu, Changzhi, Kang, Jinfeng, Yu, Richeng
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2017
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article electron holography energy-filtered image in situ TEM oxygen vacancies resistive switching
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520 |a Resistive switching processes in HfO2 are studied by electron holography and in situ energy-filtered imaging. The results show that oxygen vacancies are gradually generated in the oxide layer under ramped electrical bias, and finally form several conductive channels connecting the two electrodes. It also shows that the switching process occurs at the top interface of the hafnia layer 
650 4 |a Journal Article 
650 4 |a electron holography 
650 4 |a energy-filtered image 
650 4 |a in situ TEM 
650 4 |a oxygen vacancies 
650 4 |a resistive switching 
700 1 |a Gao, Bin  |e verfasserin  |4 aut 
700 1 |a Yao, Yuan  |e verfasserin  |4 aut 
700 1 |a Guan, Xiangxiang  |e verfasserin  |4 aut 
700 1 |a Shen, Xi  |e verfasserin  |4 aut 
700 1 |a Wang, Yanguo  |e verfasserin  |4 aut 
700 1 |a Huang, Peng  |e verfasserin  |4 aut 
700 1 |a Liu, Lifeng  |e verfasserin  |4 aut 
700 1 |a Liu, Xiaoyan  |e verfasserin  |4 aut 
700 1 |a Li, Junjie  |e verfasserin  |4 aut 
700 1 |a Gu, Changzhi  |e verfasserin  |4 aut 
700 1 |a Kang, Jinfeng  |e verfasserin  |4 aut 
700 1 |a Yu, Richeng  |e verfasserin  |4 aut 
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