Indirect Bandgap Puddles in Monolayer MoS2 by Substrate-Induced Local Strain

© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 28(2016), 42 vom: 06. Nov., Seite 9378-9384
1. Verfasser: Shin, Bong Gyu (VerfasserIn)
Weitere Verfasser: Han, Gang Hee, Yun, Seok Joon, Oh, Hye Min, Bae, Jung Jun, Song, Young Jae, Park, Chong-Yun, Lee, Young Hee
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2016
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article MoS2 bandgap direct-to-indirect bandgap transition layered materials strain
LEADER 01000naa a22002652 4500
001 NLM264104269
003 DE-627
005 20231224205348.0
007 cr uuu---uuuuu
008 231224s2016 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.201602626  |2 doi 
028 5 2 |a pubmed24n0880.xml 
035 |a (DE-627)NLM264104269 
035 |a (NLM)27601145 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Shin, Bong Gyu  |e verfasserin  |4 aut 
245 1 0 |a Indirect Bandgap Puddles in Monolayer MoS2 by Substrate-Induced Local Strain 
264 1 |c 2016 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 17.07.2018 
500 |a Date Revised 30.09.2020 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a An unusually large bandgap modulation of 1.23-2.65 eV in monolayer MoS2 on a SiO2 /Si substrate is found due to the inherent local bending strain induced by the surface roughness of the substrate, reaching the direct-to-indirect bandgap transition. Approximately 80% of the surface area reveals an indirect bandgap, which is confirmed further by the degraded photoluminescence compared to that from suspended MoS2 
650 4 |a Journal Article 
650 4 |a MoS2 
650 4 |a bandgap 
650 4 |a direct-to-indirect bandgap transition 
650 4 |a layered materials 
650 4 |a strain 
700 1 |a Han, Gang Hee  |e verfasserin  |4 aut 
700 1 |a Yun, Seok Joon  |e verfasserin  |4 aut 
700 1 |a Oh, Hye Min  |e verfasserin  |4 aut 
700 1 |a Bae, Jung Jun  |e verfasserin  |4 aut 
700 1 |a Song, Young Jae  |e verfasserin  |4 aut 
700 1 |a Park, Chong-Yun  |e verfasserin  |4 aut 
700 1 |a Lee, Young Hee  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 28(2016), 42 vom: 06. Nov., Seite 9378-9384  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:28  |g year:2016  |g number:42  |g day:06  |g month:11  |g pages:9378-9384 
856 4 0 |u http://dx.doi.org/10.1002/adma.201602626  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 28  |j 2016  |e 42  |b 06  |c 11  |h 9378-9384