A compact high-speed X-ray atomic force microscope has been developed for in situ use in normal-incidence X-ray experiments on synchrotron beamlines, allowing for simultaneous characterization of samples in direct space with nanometric lateral resolution while employing nanofocused X-ray beams. In t...
Bibliographische Detailangaben
| Veröffentlicht in: | Journal of synchrotron radiation. - 1994. - 23(2016), Pt 5 vom: 01. Sept., Seite 1110-7
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| 1. Verfasser: |
Vitorino, M V
(VerfasserIn) |
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| Weitere Verfasser: |
Fuchs, Y,
Dane, T,
Rodrigues, M S,
Rosenthal, M,
Panzarella, A,
Bernard, P,
Hignette, O,
Dupuy, L,
Burghammer, M,
Costa, L |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2016
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| Zugriff auf das übergeordnete Werk: | Journal of synchrotron radiation
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| Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't
in situ atomic force microscopy
radiation damage
semiconducting organic thin films |
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